Nanometrics Incorporated (NASDAQ:NANO) Files An 8-K Submission of Matters to a Vote of Security Holders

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Nanometrics Incorporated (NASDAQ:NANO) Files An 8-K Submission of Matters to a Vote of Security Holders
Item 5.07 – Submission of Matters to a Vote of Security Holders.

On May 22, 2018, Nanometrics Incorporated held its 2018 Annual Meeting of Stockholders (the “Annual Meeting”). The final results of voting for each matter submitted to a vote of the stockholders at the Annual Meeting are as follows:

1.

The stockholders elected J. Thomas Bentley, Edward J. Brown Jr., Robert Deuster, Bruce C. Rhine, Christopher A. Seams, Timothy J. Stultz, Ph.D. and Christine A. Tsingos as directors of Nanometrics, each to serve until the next annual meeting and until his or her respective successor has been duly elected and qualified. The voting for each director was as follows:

Nominee

For

Withheld

Broker Non-Votes

J. Thomas Bentley

19,262,330

66,755

2,318,093

Edward J. Brown, Jr.

18,997,765

331,320

2,318,093

Robert Deuster

19,286,832

42,253

2,318,093

Pierre-Yves Lesaicherre, Ph.D.

19,274,484

54,601

2,318,093

Bruce C. Rhine

18,967,996

361,089

2,318,093

Christopher A. Seams

19,017,519

311,566

2,318,093

Timothy J. Stultz, Ph.D.

19,047,148

281,937

2,318,093

Christine A. Tsingos

19,288,577

40,508

2,318,093

2.

The stockholders approved, on an advisory (non-binding) basis, the compensation paid to Nanometrics’ executive officers in 2017, as disclosed in Nanometrics’ proxy statement for the Annual Meeting, by the following vote:

Votes For

Votes Against

Abstain

Broker Non-Votes

18,617,578

701,731

9,776

2,318,093

3.

The stockholders ratified PricewaterhouseCoopers, LLP as Nanometrics’ independent registered public accounting firm for the fiscal year ending December 29, 2018, by the following vote:

Votes For

Votes Against

Abstain

Broker Non-Votes

21,523,559

114,179

9,440

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About Nanometrics Incorporated (NASDAQ:NANO)

Nanometrics Incorporated (Nanometrics) provides process control metrology and inspection systems used in the fabrication of integrated circuits, high-brightness light emitting diodes (HB-LEDs), discrete components and data storage devices. The Company operates in the segment of sale, design, manufacture, marketing and support of thin film and optical critical dimension systems. The Company’s automated and integrated systems address process control applications, including critical dimension and film thickness measurement, device topography, defect inspection, and analysis of various other film properties, such as optical, electrical and material characteristics. The Company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications.