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VEECO INSTRUMENTS INC. (NASDAQ:VECO) Files An 8-K Regulation FD Disclosure

VEECO INSTRUMENTS INC. (NASDAQ:VECO) Files An 8-K Regulation FD Disclosure
Item 7.01 Regulation FD Disclosure

Veeco Instruments Inc. (“Veeco”) plans to attend an investor conference and certain investor meetings on January15, 2019. A copy of Veeco’s presentation for this conference is furnished as Exhibit99.1 to this report and will be available on Veeco’s website (www.veeco.com) prior to or simultaneously with the first of these meetings.

The information in this report, including the exhibit, shall not be deemed “filed” for purposes of Section18 of the Securities Exchange Act of 1934, as amended (the “Exchange Act”), or otherwise subject to the liabilities under that Section, nor shall it be deemed to be incorporated by reference into any filing under the Securities Act of 1933, as amended, or the Exchange Act, except as expressly set forth by specific reference in such a filing.

Section9 – Financial Statements and Exhibits

Item 9.01 Financial Statements and Exhibits

(c) Exhibits.

Exhibit

Description

99.1

Veeco Investor Presentation dated January15, 2019

VEECO INSTRUMENTS INC Exhibit
EX-99.1 2 a19-2899_1ex99d1.htm EX-99.1 Exhibit 99.1 Veeco Instruments Inc. Investor Presentation January 15,…
To view the full exhibit click here

About VEECO INSTRUMENTS INC. (NASDAQ:VECO)

Veeco Instruments Inc. designs, manufactures, markets and supports thin film equipment. The Company’s equipment is used to make electronic devices, including light emitting diodes (LED), micro-electromechanical systems (MEMS), wireless devices, power electronics, hard disk drives (HDDs) and semiconductors. The Company operates in four geographic regions: United States; China; Europe, the Middle East and Africa, and the Rest of World. The Company is a supplier of metal organic chemical vapor deposition (MOCVD) systems. The Company’s Precision Surface Processing’s platforms include WaferEtch and the WaferStorm. The Company’s NEXUS Ion Beam Deposition (IBD) systems utilize ion beam technology to deposit precise layers of thin films. The Company makes an array of deposition systems, including Physical Vapor Deposition, Diamond Like Carbon Deposition and Chemical Vapor Deposition Systems.

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